Kwanan nan, masu amfani da yawa sun yi tambaya game da abũbuwan amfãni da rashin amfani da fasaha na sputtering, bisa ga bukatun abokan cinikinmu, yanzu masana daga Sashen Fasaha na RSM za su raba tare da mu, suna fatan magance matsalolin.Wataƙila akwai abubuwa masu zuwa:
1. Magnetron sputtering mara daidaituwa
Zaton cewa motsin maganadisu da ke wucewa ta ciki da na waje na Magnetic sandar iyakar magnetron sputtering cathode ba daidai ba ne, katode ne mara daidaituwa na magnetron sputtering.Filin maganadisu na talakawa magnetron sputtering cathode yana mai da hankali a kusa da wurin da ake niyya, yayin da filin maganadisu na katode mara daidaituwa na magnetron sputtering cathode yana haskakawa daga abin da ake hari.Filin maganadisu na magnetron cathode na yau da kullun yana ƙuntata plasma tam kusa da abin da ake nufi, yayin da plasma kusa da abin da ke kusa da substrate ba shi da rauni sosai, kuma ions da electrons masu ƙarfi ba za su yi bombarded da substrate.Filin maganadisu mara daidaituwa na magnetron cathode na iya tsawaita plasma nesa da abin da ake niyya kuma ya nutsar da substrate.
2. Mitar rediyo (RF) sputtering
Ka'idar ajiyar fim mai rufewa: ana amfani da mummunan tasiri ga jagoran da aka sanya a baya na maƙasudin rufewa.A cikin plasma mai haske, lokacin da farantin jagorar ion tabbatacce ya hanzarta, yana jefa makasudin rufewa a gabansa don sputing.Wannan sputtering iya wuce 10-7 seconds.Bayan haka, ingantaccen yuwuwar da aka samu ta hanyar ingantaccen cajin da aka tara akan maƙasudin insulating yana ɓata mummunan tasiri akan farantin madubi, don haka an dakatar da bam ɗin ions masu ƙarfi masu ƙarfi akan maƙasudin insulating.A wannan lokacin, idan polarity na samar da wutar lantarki ya koma baya, electrons za su jefar da farantin insulating kuma su kawar da tabbataccen cajin da ke kan farantin insulating a cikin daƙiƙa 10-9, wanda zai zama sifili.A wannan lokacin, juyawa polarity na samar da wutar lantarki na iya haifar da sputtering na 10-7 seconds.
Fa'idodin RF sputtering: duka maƙasudin ƙarfe da maƙasudin dielectric ana iya watsawa.
3. DC magnetron sputtering
A magnetron sputtering shafi kayan aiki yana ƙaruwa da Magnetic filin a cikin DC sputtering cathode manufa, yana amfani da Lorentz karfi na Magnetic filin don ɗaure da kuma mika yanayin da electrons a cikin lantarki filin, ƙara da damar na karo tsakanin electrons da gas atoms, ƙara da ionization rate of gas atoms, yana ƙara yawan adadin ions masu ƙarfi da ke jefa bama-bamai akan manufa kuma yana rage yawan adadin kuzarin lantarki mai ƙarfi da ke bama boma-bomai.
Amfanin planar magnetron sputtering:
1. Ƙarfin ƙarfin da aka yi niyya zai iya kaiwa 12w / cm2;
2. Maƙasudin ƙarfin lantarki zai iya kaiwa 600V;
3. Matsin gas zai iya kaiwa 0.5pa.
Rashin hasara na sputtering magnetron planar: manufa ta samar da tashar sputtering a cikin titin titin jirgin sama, da etching na gaba dayan farfajiyar manufa ba daidai ba ne, kuma ƙimar amfani da manufa shine kawai 20% - 30%.
4. Intermediate mita AC magnetron sputtering
Yana nufin cewa a cikin matsakaicin mitar AC magnetron sputtering kayan aiki, yawanci biyu hari tare da girman da siffa iri ɗaya ana saita gefe da gefe, sau da yawa ake magana a kai a matsayin tagwaye hari.An dakatar da shigarwa.Yawancin lokaci, ana amfani da hari biyu a lokaci guda.A kan aiwatar da matsakaicin mitar AC magnetron amsawa sputtering, biyu hari aiki a matsayin anode da cathode bi da bi, kuma suna aiki a matsayin anode cathode juna a cikin wannan rabin sake zagayowar.Lokacin da maƙasudin ya kasance a matsakaicin matsakaicin rabin sake zagayowar, abin da aka yi niyya yana jefa bam kuma ana watsa shi ta hanyar ions masu kyau;A cikin ingantaccen zagayowar rabin zagayowar, electrons na plasma suna haɓaka zuwa farfajiyar da aka niyya don kawar da ingantaccen cajin da aka tara akan farfajiyar insulating na farfajiyar manufa, wanda ba wai kawai yana murƙushe ƙonewa na farfajiyar manufa ba, har ma yana kawar da sabon abu na " bacewar anode”.
Fa'idodin tsaka-tsakin mitar mitar niyya ninki biyu su ne:
(1) Yawan ajiya mai girma.Don maƙasudin siliki, ƙimar ƙididdigewa na matsakaicin mitar mai amsa sputtering shine sau 10 fiye da na DC.
(2) Ana iya daidaita tsarin sputtering a wurin da aka saita;
(3) An kawar da abin da ke faruwa na "ƙonawa".Yawan lahani na fim ɗin da aka shirya yana da oda da yawa na girma ƙasa da na hanyar da za a yi sputtering DC;
(4) Mafi yawan zafin jiki na substrate yana da amfani don inganta inganci da mannewa na fim;
(5) Idan wutar lantarki ta fi sauƙi don dacewa da manufa fiye da wutar lantarki na RF.
5. Reactive magnetron sputtering
A cikin tsarin sputtering, ana ciyar da iskar gas don amsawa tare da ɓangarorin sputtered don samar da fina-finai masu haɗaka.Yana iya samar da iskar gas mai amsawa don amsawa tare da maƙasudin fili a lokaci guda, kuma yana iya samar da iskar gas mai amsawa don amsawa tare da maƙalar sputtering karfe ko gami a lokaci guda don shirya fim ɗin fili tare da ƙimar sinadarai da aka bayar.
Fa'idodin fina-finan da ke ba da amsawa na magnetron sputtering:
(1) Abubuwan da aka yi niyya da iskar gas da aka yi amfani da su sune oxygen, nitrogen, hydrocarbons, da dai sauransu, waɗanda yawanci suna da sauƙin samun samfurori masu tsabta, wanda ya dace da shirye-shiryen fina-finai masu tsabta;
(2) Ta hanyar daidaita sigogi na tsari, ana iya shirya fina-finai na sinadarai ko marasa sinadarai, ta yadda za a iya daidaita halayen fina-finai;
(3) The substrate zafin jiki ba high, kuma akwai 'yan ƙuntatawa a kan substrate;
(4) Ya dace da babban yanki uniform shafi da gane masana'antu samar.
A cikin aiwatar da reactive magnetron sputtering, rashin zaman lafiyar fili sputtering abu ne mai sauki faruwa, yafi ciki har da:
(1) Yana da wuya a shirya abubuwan da ake hari;
(2) Abubuwan da ke faruwa na bugun baka (harbin baka) wanda ya haifar da gubar manufa da rashin kwanciyar hankali na tsarin sputtering;
(3) Rage yawan zubewa;
(4) Rashin ƙarancin fim ɗin yana da yawa.
Lokacin aikawa: Jul-21-2022