Tungsten Silicide

Tungsten silicide WSi2 ana amfani dashi azaman kayan girgiza lantarki a cikin microelectronics, shunting akan wayoyi na polysilicon, murfin anti-oxidation da murfin waya juriya.Tungsten silicide ana amfani dashi azaman abun sadarwa a cikin microelectronics, tare da juriya na 60-80μΩcm.An kafa shi a 1000 ° C.Yawancin lokaci ana amfani da shi azaman shunt don layukan polysilicon don haɓaka haɓakarsa da haɓaka saurin sigina.Za a iya shirya Layer Silicide tungsten ta hanyar tururi na sinadarai, kamar zubar da tururi.Yi amfani da monosilane ko dichlorosilane da tungsten hexafluoride azaman ɗanyen gas.Fim ɗin da aka ajiye ba stoichiometric ba ne kuma yana buƙatar annealing don a canza shi zuwa wani nau'i na stoichiometric mai gudanarwa.

Tungsten silicide zai iya maye gurbin fim din tungsten na baya.Tungsten silicide kuma ana amfani dashi azaman shinge mai shinge tsakanin silicon da sauran karafa.

Tungsten silicide shima yana da kima sosai a tsarin microelectromechanical, wanda tungsten silicide galibi ana amfani dashi azaman fim na bakin ciki don kera microcircuits.Don wannan dalili, fim din tungsten silicide zai iya zama plasma-etched ta amfani da, misali, silicide.

Kayayyakin Musamman Masu Arziki sun ƙware wajen kera Sputtering Target kuma suna iya samar da Tungsten Silicide sputtering Materials bisa ga ƙayyadaddun Abokan ciniki.Don ƙarin bayani, da fatan za a tuntuɓe mu.